JSYAPG‑S005 glass polishing slurry is an aqueous precision polishing suspension formulated with a carefully optimized mixture of colloidal silica nanoparticles and fine ceria particles in high‑purity deionized water. It incorporates specialized dispersants, anti‑settling stabilizers and pH‑adjusting additives. Multi‑stage fine filtration removes oversized hard agglomerates. This polishing slurry is developed for cover glass, LCD panel, optical glass and quartz crystal components. The synergistic

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Product Detail Page: JSYAPG‑S005 polishing slurry is produced by precise proportioning of colloidal silica and fine ceria powder. Raw abrasive materials are subjected to particle‑size classification and impurity elimination before wet compounding. High‑shear dispersion processing ensures uniform distribution of mixed abrasives inside deionized‑water carrier. Functional dispersing and anti‑sedimentation additives reduce the tendency of dense ceria particles to settle. Every finished production batch undergoes particle‑size testing, sedimentation inspection and coarse‑particle counting to guarantee consistent quality for optoelectronic polishing lines.

Cover glass, LCD glass, optical glass and quartz crystal are widely applied in consumer electronics and optical industries. Quartz crystal features higher chemical inertness and hardness compared to common soda‑lime silicate glass. Single ceria‑based polishing slurry provides fast removal rate but may induce occasional fine scratches on hard quartz substrates. Pure colloidal silica slurry achieves excellent scratch‑free surfaces yet suffers from relatively low removal efficiency. These limitations restrict production throughput on mixed‑material processing lines where both soft glass and hard quartz workpieces are manufactured.

By blending colloidal silica and ceria abrasives, this product strikes a balance between polishing removal speed and surface finish quality. The fine ceria fraction contributes efficient stock removal on silicate‑based glass surfaces. Spherical colloidal silica nanoparticles perform gentle nano‑level finishing on hard quartz crystal, helping to reduce subsurface micro‑cracks. Optimized suspension additives slow down sedimentation during continuous circulation on polishing production lines. This slurry is suitable for large flat polishing machines for cover glass and LCD panels, as well as precision polishing equipment for optical glass and quartz crystal components. Multiple particle‑size grades support sequential rough‑to‑fine polishing workflows.

During on‑site operation, working solid content can be adjusted by diluting the concentrated slurry with deionized water. Operators should optimize key process parameters including polishing down‑force, platen rotating speed, slurry circulation flow‑rate and polishing pad selection. Recirculated slurry must run through filtration systems to intercept glass and quartz debris generated during polishing cycles.

Foreign particulate contamination, prolonged high‑temperature storage and direct sunlight exposure must be strictly avoided. Elevated temperature will accelerate sedimentation of ceria particles and induce nanoparticle aggregation, which raises scratch risk in subsequent polishing operations.

Major application fields include precision polishing of mobile device cover glass, surface planarization of LCD display glass substrates, finishing of optical glass elements, nano‑smooth polishing for quartz crystal components.

Store the product in tightly‑sealed original plastic drums within 10‑30℃. Keep away from direct sunlight. Sufficient mechanical stirring is required before using long‑term stored batches.

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(JSYAPG-S005) Glass Polishing Slurry Colloidal Silica/Ceria, for Cover Glass, LCD, Optical Glass & Quartz Crystal

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Jishengya Technology

Shenzhen Jishengya Technology Co., Ltd. is located in Shenzhen, a special economic zone, and is a comprehensive technology enterprise integrating independent R&D, production and sales.