JSYAPG‑S004 high‑purity rare‑earth cerium oxide polishing slurry is a water‑based suspension adopting classified rare‑earth cerium oxide powder as core abrasive. It is compounded with high‑efficiency dispersing agents, anti‑settling stabilizers and pH regulators. Strict particle‑size classification and filtration are implemented to reduce coarse particle content. This slurry is designed for precision polishing of optical lens, LCD display glass panels and various flat glass substrates. It combin

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Product Detail Page: JSYAPG‑S004 cerium oxide polishing slurry is produced from high‑purity rare‑earth cerium oxide raw material. The cerium oxide powder undergoes calcination, milling and multi‑stage air classification to control particle‑size distribution. In the wet‑formulation workshop, deionized water is used as liquid carrier. Dispersants and anti‑sedimentation additives are added, followed by high‑shear dispersion and fine filtration to remove oversized particles and hard agglomerates. Each production batch is inspected for particle‑size distribution, sedimentation property and abrasive impurity level before delivery.

Glass, LCD panel and optical lens are typical brittle inorganic substrates. In optoelectronic mass production, both high polishing throughput and superior surface quality are required. When conventional silica‑based slurry is used for glass polishing, the material removal speed is relatively low, which limits production capacity. Hard coarse abrasive grains will create permanent micro‑scratches and subsurface cracks on glass. These hidden subsurface fractures reduce mechanical strength of LCD panels, and cause light scattering defects on optical lenses, resulting in high reject rates for optoelectronic components.

Cerium oxide possesses unique chemical activity towards silicate glass. During polishing, cerium oxide particles chemically soften the glass surface layer, meanwhile mechanical grinding removes the softened layer continuously. This synergy of chemical and mechanical action achieves higher removal speed compared to silica abrasives. Optimized anti‑settling additives slow down rapid sedimentation of dense cerium oxide particles during equipment circulation. The slurry is compatible with large‑size flat glass polishing machines, LCD panel polishing lines and optical lens spherical polishing equipment. Multiple particle‑size grades are available for rough stock removal, intermediate leveling and final fine polishing workflows.

In practical production, technicians can dilute the concentrated slurry with deionized water to adjust working solid content. Process parameters including polishing pressure, platen rotation speed and slurry circulation feed‑rate shall be adjusted based on substrate hardness and target surface quality. Recirculated slurry should pass through filtration units to intercept glass debris generated during polishing.

Foreign contamination, prolonged high‑temperature storage and direct sunlight exposure must be strictly avoided. Long‑term high‑temperature standing accelerates heavy abrasive sedimentation and hard packing at the bottom of the drum, which will increase scratch risk when the settled solids cannot be fully re‑dispersed.

Major application fields include high‑speed polishing for optical glass lenses, planar finishing for large‑size LCD display panels, precision surface processing of silicate flat glass substrates.

Store the product in tightly‑sealed original plastic drums within 10‑30℃. Keep away from direct sunlight. Sufficient mechanical stirring is mandatory before using batches after long‑term storage.

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(JSYAPG-S004) Cerium Oxide Polishing Slurry High-Purity Rare-Earth CAS 1306-38-3, for Glass, LCD Panel & Optical Lens

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Jishengya Technology

Shenzhen Jishengya Technology Co., Ltd. is located in Shenzhen, a special economic zone, and is a comprehensive technology enterprise integrating independent R&D, production and sales.