(JSYAPG-SM) Colloidal Silica Slurry 7nm 30% SiO₂ CAS 112926-00-8, Sodium-Stabilized Nano Silica for Precision Polishing & Catalyst Carrier
JSYAPG‑SM colloidal silica slurry is water‑based amorphous nano silica sol with 7 nm average particle size and 30 wt% silica solid content. It adopts sodium‑ion electrostatic stabilization without extra organic dispersants. Spherical nano silica particles deliver mild abrasive property for ultra‑fine precision polishing, meanwhile the high specific‑surface‑area silica framework serves as an effective inorganic carrier for catalyst active components. This aqueous slurry can be used directly or di
Product Detail Page: This sodium‑stabilized colloidal silica slurry consists of amorphous spherical silica nanoparticles uniformly dispersed inside deionized water medium. Negative surface charge derived from sodium‑ion stabilization creates strong electrostatic repulsion between individual silica particles, which effectively restrains particle aggregation, flocculation and sedimentation under recommended storage conditions. The average particle size is strictly controlled at 7 nm with narrow particle‑size distribution, ensuring consistent specific surface area and stable batch‑to‑batch performance.
In precision polishing applications, ultrafine spherical silica particles act as soft chemical‑mechanical abrasive media. During polishing cycles, it achieves gentle material removal on wafer substrates, optical crystals and precision hard surfaces. It minimizes micro‑scratches, surface pits and subsurface damage, helping to obtain ultra‑low surface roughness after planarization processing.
When deployed as catalyst carrier, the abundant nano‑porous surface provides sufficient anchoring sites for loading metal and metal‑oxide active substances. The high specific surface area supports homogeneous dispersion of catalytic active phases, improves catalytic reaction activity and enhances thermal stability of finished catalyst products.
The slurry exhibits moderate viscosity at normal ambient temperature. Users can dilute the stock slurry with high‑purity deionized water according to targeted formulation requirements. Harsh operating conditions including strong acid environment, overheating and freezing must be avoided. Such extreme conditions will destroy the electrostatic colloidal balance and result in irreversible silica gelation and solid precipitation.
Major application areas cover precision optical component finishing, semiconductor auxiliary polishing, heterogeneous catalyst carrier synthesis, high‑performance ceramic binder and special industrial surface treatment formulations.
Store the product in tightly sealed original plastic containers within temperature range 5‑35℃. Keep away from direct sunlight and freezing environment. Standard industrial packaging includes plastic drums and IBC totes for bulk liquid shipment. Gentle periodic circulation is recommended for long‑term stock storage to slow down bottom sediment formation.
Copy product links
Long by picture save/share
Add Successfully
(JSYAPG-SM) Colloidal Silica Slurry 7nm 30% SiO₂ CAS 112926-00-8, Sodium-Stabilized Nano Silica for Precision Polishing & Catalyst Carrier
Add Successfully
Jishengya Technology
Shenzhen Jishengya Technology Co., Ltd. is located in Shenzhen, a special economic zone, and is a comprehensive technology enterprise integrating independent R&D, production and sales.
点击右上角
分享给朋友吧
Copyright © 2005-2026 Shenzhen Jishengya Technology Co., Ltd. All Rights Reserved.
